NAVIGATION

CONTACT US

Tel:
Fax:
Address:
Email: For product inquiries, please use our online system or send an email to
To receive a copy of our product catalog, please contact us at

chemistry partner
  • Home
  • Products
  • Metals and Materials
  • Evaporation Materials

    • Evaporation Materials

    Products Inquiry
    Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Ca) Inquiry
    Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Ca) Inquiry
    Magnesium oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Ca) Inquiry
    Magnesium oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Ca) Inquiry
    Niobium(V) oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis) Inquiry
    Niobium(V) oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis) Inquiry
    Niobium(V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis) Inquiry
    Niobium(V) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis) Inquiry
    Silicon carbide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis excluding B) Inquiry
    Silicon carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis excluding B) Inquiry
    Silicon carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis excluding B) Inquiry
    Silicon carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis excluding B) Inquiry
    Silicon(IV) nitride, MgO binder, sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis) Inquiry
    Silicon(IV) nitride, MgO binder, sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis) Inquiry
    Silicon(IV) nitride, MgO binder, sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.9% (metals basis) Inquiry
    Silicon(IV) oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.995% (metals basis) Inquiry
    Silicon(IV) oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis) Inquiry
    Silicon(IV) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.995% (metals basis) Inquiry
    Silicon(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis) Inquiry
    Tantalum(V) oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis) Inquiry

    Quick Inquiry

    Verification code
    qrcode

    Products

    Alternative Energy
    Micro-Nano Electric Materials
    Nanomaterials
    Organic and Printed Electronics
    Photonic and Optical Materials
    Polymer Science

    Share

    Interested in our Services & Products? Need detailed information?
    facebook twitter linkedin

    Contact Us

    Email:
    Tel:
    Fax:
    Address:

    Privacy Policy | Cookie Policy | Copyright © 2024 Alfa Chemistry. All rights reserved.       Home | Terms & Conditions