Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)

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Catalog Number

ACMA00014799

Product Name

Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)

Category

Evaporation Materials

Application

The titanium silicide sputtering target, measuring 50.8 mm in diameter and 6.35 mm in thickness with a purity of 99.5% (metals basis), is designed for use in specialized technological applications. Its primary purpose is to serve as a highly effective sputtering target in the fabrication of integrated circuits, benefiting from its notable electrical properties. Additionally, it is utilized in the development of special alloys and as a coating material that is resistant to flame and blast impingement. These properties make it an invaluable resource for industries requiring materials with specific hardness and resistivity characteristics, as evidenced by its use in various high-tech and industrial applications.

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