Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)

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Catalog Number

ACMA00014800

Product Name

Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)

Category

Evaporation Materials

Application

The Titanium silicide sputtering target, with its precise dimensions and high purity, is engineered for specialized applications in the fabrication of integrated circuits. Known for its excellent physical properties, this target is utilized in creating a conductive layer that enhances circuit performance. Also employed in the development of special alloys and as a flame-resistant coating, the material's adaptability in high-technology manufacturing processes highlights its utility. Its implementation ensures durability and efficiency, making it a critical component in advanced electronic applications.

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