Tantalum(V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis)

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Catalog Number

ACMA00014797

Product Name

Tantalum(V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.9% (metals basis)

Category

Evaporation Materials

Application

The Tantalum(V) oxide sputtering target, with dimensions of 76.2mm (3.0in) in diameter and 3.18mm (0.125in) in thickness, and a purity of 99.9% (metals basis), serves a crucial role in advanced material applications due to its unique properties. Derived from tantalum pentoxide (Ta2O5), known for its stability across various modifications, this sputtering target is instrumental in the deposition processes used to manufacture specialized optical glass, lasers, and components within electronic circuits. Its resistance to solubility in water and most acid and alkali solutions, coupled with its capacity to be dissolved for analytical purposes by fusion with specific compounds, highlights its versatility. Therefore, the product is an essential tool in the creation of high-performance, technology-driven solutions in the fields of optics and electronics.

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