Yttrium(III) oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)

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Catalog Number

ACMA00014801

Product Name

Yttrium(III) oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)

Category

Evaporation Materials

Application

The Yttrium(III) oxide sputtering target, with a diameter of 50.8mm and a thickness of 3.18mm, and featuring a purity of 99.99% (metals basis), is designed for advanced material applications requiring high precision and purity. Made available in a form suitable for sputtering purposes, this product is particularly adept at contributing to the creation of hard films, dielectric coatings, and thin film capacitors. Its utility extends across various high-tech fields, benefiting from its capacity to support experimental melting processes, evaporation for coatings, and influencing phase formations and sintering behaviors vital in the development of perovskite-type structures. Additionally, it finds relevance in the production of neodymium Nd:YAG lasers and in the manufacturing components of MOS and LED transistors, thereby serving as a versatile component in cutting-edge technologies.

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