Yttrium(III) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)

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Catalog Number

ACMA00014802

Product Name

Yttrium(III) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)

Category

Evaporation Materials

Application

The Yttrium(III) oxide sputtering target, with a diameter of 76.2 mm and thickness of 3.18 mm, boasting a purity of 99.99% on a metals basis, is designed for the creation of hard films, dielectric coatings, and thin film capacitors. Its role extends to use in experimental and proprietary processes, facilitated through its composition as white powder or sintered tablets. The material's readiness to absorb atmospheric CO2, alongside its enthalpy of fusion of 105.00 kJ/mol, underscores its suitability for crucible forms in melting experiments and as evaporation material. The target plays a critical part in forming perovskite-type structures like YAlO3 with chrome ions and is integral to understanding the phase formation and sintering characteristics when used as a dopant. Additionally, it has applications in manufacturing components for neodymium Nd:YAG lasers, as well as MOS and LED transistors.

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