Tantalum(V) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.9% (metals basis)

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Catalog Number

ACMA00014798

Product Name

Tantalum(V) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.9% (metals basis)

Category

Evaporation Materials

Application

The Tantalum(V) oxide sputtering target, with a diameter of 76.2mm (3.0 inches) and thickness of 6.35mm (0.250 inches), and 99.9% purity (metals basis), serves a vital role in the development of high-tech applications. This product, derived from tantalum pentoxide (Ta2O5)-a compound known for its stability and unique properties under various temperatures-finds its purpose in manufacturing special optical glass, facilitating laser technologies, and enhancing electronic circuits. Its robust resistance to water and common acids further underscores its importance in these specialized applications, providing a reliable foundation for cutting-edge technological advancements.

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