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Tungsten etchant

Catalog Number
ACMA00016144
Product Name
Tungsten etchant
Category
Electronic Materials
Application
Tungsten etchant is designed for use in semiconductor and microelectronics technology, providing high-resolution patterns with minimal undercutting while being compatible with photoresist. This ready-to-use etchant features buffered, mildly alkaline ferricyanide-based formulations that ensure controlled and uniform etching through either immersion or spray techniques. With an etch capacity of 64 g/gallon, its efficiency is maintained until about 70% of the rate declines. The recommended operating temperatures range from 20 to 80 °C, with 30 to 40 °C being the most common for optimal performance.
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