Graphene ink for spin/spray coating photonically annealable

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Graphene ink for spin/spray coating photonically annealable

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Catalog Number

ACMA00003258

Product Name

Graphene ink for spin/spray coating photonically annealable

Category

Bioelectronic Materials

Synonyms

Conductive ink,Graphene ink

Appearance

dispersion (black)

Application

Spin-coating:Spin-coating a single layer at 2000-5000 rpm yields a final film thickness of 40-60 nm. To achieve thicker films, multiple layers can be applied without a baking step. This is recommended over using a lower spin speed to maintain film uniformity.Electrical performance:Following a baking step at 300 °C for 30 minutes in air, the spin-coated films exhibit sheet resistance of 300-800 Ω/sq, corresponding to a resistivity of 0.003-0.004 Ω−cm. With 5 coats at 2000 rpm, a 200 nm thick film with a sheet resistance of 160 Ω/sq. is obtained.General guidelines:Ethanol is recommended for cleaning up the ink and dried films, as well as dilution. Bath sonication (5-10 minutes) of the ink prior to use is recommended following extended periods of disuse.

Storage

room temp

Concentration

1.8-3.0 wt. % solids

Form

dispersion (black)

Size

≤3 μm

True Density

0.78-0.88 g/mL at 25 °C

Viscosity

2-4 mPa.s(20-30 °C) (10-1000 s-1)