Vapor Deposition Precursors - Materials / Alfa Chemistry

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Vapor Deposition Precursors

Products	Inquiry
Dodecamethylcyclohexasilane	Inquiry
CAS Number: 4098-30-0 Molecular Formula: (Si(CH3)2)6
Tris[N,N-bis(trimethylsilyl)amide]yttrium	Inquiry
CAS Number: 41836-28-6 Molecular Formula: C18H54N3Si6Y
1,2-Dichlorotetramethyldisilane	Inquiry
CAS Number: 4342-61-4 Molecular Formula: C4H12Cl2Si2
Indium tin oxide	Inquiry
CAS Number: 50926-11-9 Molecular Formula: In2O5Sn
Tris(ethylmethylamido)(tert-butylimido)tantalum(V)	Inquiry
CAS Number: 511292-99-2 Molecular Formula: C₁₃H₃₃N₄Ta
Triisopropyl borate	Inquiry
CAS Number: 5419-55-6 Molecular Formula: C9H21BO3
Titanium(IV) isopropoxide	Inquiry
CAS Number: 546-68-9 Molecular Formula: C12H28O4Ti
Vanadium(V) oxytriisopropoxide	Inquiry
CAS Number: 5588-84-1 Molecular Formula: OV(OCH(CH3)2)3
Bis(ethylcyclopentadienyl)cobalt(II)	Inquiry
CAS Number: 55940-05-1 Molecular Formula: C₁₄H₁₈Co
Triamminetungsten(IV) tricarbonyl	Inquiry
CAS Number: 58204-42-5 Molecular Formula: C3H9N3O3W;
Dimethylselenide	Inquiry
CAS Number: 593-79-3 Molecular Formula: C2H6Se
Bis[bis(trimethylsilyl)amino]tin ii	Inquiry
CAS Number: 59863-13-7 Molecular Formula: C12H36N2Si4Sn
Triphenylbismuth	Inquiry
CAS Number: 603-33-8 Molecular Formula: C18H15Bi
Triphenylantimony(III)	Inquiry
CAS Number: 603-36-1 Molecular Formula: (C6H5)3Sb
Trimethylboron-d9	Inquiry
CAS Number: 6063-55-4 Molecular Formula: C₃BD₉
Tantalum(V) ethoxide	Inquiry
CAS Number: 6074-84-6 Molecular Formula: Ta(OC2H5)5
2,4,6,8,10-Pentamethylcyclopentasiloxane	Inquiry
CAS Number: 6166-86-5 Molecular Formula: (CH3SiHO)5
Tetraethylsilane	Inquiry
CAS Number: 631-36-7 Molecular Formula: C8H20Si
Bis(isopropylcyclopentadienyl)tungsten(IV) dihydride	Inquiry
CAS Number: 64561-25-7 Molecular Formula: (C5H4CH(CH3)2)2WH2
Bis(pentamethylcyclopentadienyl)dimethylzirconium(IV), 99%	Inquiry
CAS Number: 67108-80-9 Molecular Formula: C22H36Zr