Synonyms
Tetrakis-trimethylsilyloxy-silan; Tetrakis(trimethylsiloxy)silane; 1,1,1,5,5,5-hexamethyl-3,3-bis-trimethylsilanyloxy-trisiloxane; Tetrakis-trimethylsiloxy-silan; 3.3-Bis-trimethylsiloxy-hexamethyltrisiloxan; Orthokieselsaeure-tetrakis-trimethylsilylester; 1,1,1,5,5,5-Hexamethyl-3,3-bis-trimethylsilyloxy-trisiloxan;
Application
Tetrakis(Trimethylsiloxy)Silane is an organosilicon compound primarily used as a precursor in the synthesis of nanostructured organosilicon polymer films through plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure Additionally it serves a crucial role in the production of low dielectric constant SiCOH films when used in combination with cyclohexane utilizing the PECVD method