Product Name
Tantalum(V) ethoxide
Category
Solution Deposition Precursors; Vapor Deposition Precursors
Synonyms
PET,Pentaethoxytantalum,Pentaethyl tantalate,Tantalum pentaethoxide
IUPAC Name
ethanolate;tantalum(5+);
Molecular Formula
Ta(OC2H5)5
Canonical SMILES
CCO[Ta](OCC)(OCC)(OCC)OCC
InChI
1S/5C2H5O.Ta/c5*1-2-3;/h5*2H2,1H3;/q5*-1;+5,HSXKFDGTKKAEHL-UHFFFAOYSA-N
InChI Key
HSXKFDGTKKAEHL-UHFFFAOYSA-N
Melting Point
21 °C (lit.)
Application
Tantalum(V) ethoxide precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods
Covalently-Bonded Unit Count
6
Monoisotopic Mass
406.118g/mol
Packaging
25 g in stainless steel cylinder
Topological Polar Surface Area
115A^2