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Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
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Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
Hafnium(IV) oxide sputtering target, 101.4mm (4.0in) dia x 6.35mm (0.25in) thick, 99.95% (metals basis excluding Zr)
Titanium nitride sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
: 25583-20-4
Titanium nitride sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
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Alternative Energy Micro-Nano Electric Materials Nanomaterials Organic and Printed Electronics Photonic and Optical Materials Polymer Science
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