Catalog Number
ACM2172023-1
Product Name
Hafnium(IV) tert-butoxide
Category
Solution Deposition Precursors; Vapor Deposition Precursors
Synonyms
Hafnium tetra-t -butoxide,Hafnium tetrakis(t -butoxide),Tetra-t -butoxyhafnium,Tetrakis(t -butoxy)hafnium
IUPAC Name
hafnium(4+);2-methylpropan-2-olate
Molecular Formula
Hf[OC(CH3)3]4
Canonical SMILES
CC(C)(C)O[Hf](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C
InChI
1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4,WZVIPWQGBBCHJP-UHFFFAOYSA-N
InChI Key
WZVIPWQGBBCHJP-UHFFFAOYSA-N
Application
Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.
Covalently-Bonded Unit Count
5
Monoisotopic Mass
472.20792g/mol
Packaging
10 g in stainless steel cylinder