Buffer HF improved - Materials / Alfa Chemistry

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Buffer HF improved

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Catalog Number

ACMA00016156

Product Name

Buffer HF improved

Category

Electronic Materials

Application

Buffer HF improved is designed to effectively dissolve silica films, both thermally grown and silane-based SiO2, which are produced on silicon surfaces and exposed by photolithography. It is also capable of dissolving doped silica films such as phosphosilicate and borosilicate glasses, commonly formed during semiconductor processing. This product plays a critical role in the latest technologies for manufacturing semiconductor planar and mesa devices, with a chemistry that involves the reaction 4HF + SiO2 → SiF4 + 2H2O. Buffer HF improved is compatible with both negative and positive photoresists, ensuring excellent results with high reproducibility. This makes it easy to achieve desired outcomes without the risk of undercutting marked oxides, causing surface staining, or degrading devices with metallic impurities.

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※ Please kindly note that our products are for research use only.