Catalog Number
ACMA00016295
Product Name
Bis(triisopropylcyclopentadienyl)barium tetrahydrofuran adduct
Category
Vapor Deposition Precursors
Synonyms
Bis(1,2,4-triisopropylcyclopentadienyl)barium,Bis[1,2,4-tris(1-methylethyl)-2,4-cyclopentadien-1-yl]barium
Molecular Formula
[Ba(C5(C3H7)3H2)2] ⋅ 2(C4H8O)
Canonical SMILES
CC(C)[C]1[C][C](C(C)C)[C][C]1C(C)C.CC(C)[C]2[C][C](C(C)C)[C][C]2C(C)C.[Ba].C3CCOC3.C4CCOC4
InChI
1S/2C14H23.2C4H8O.Ba.2H/c2*1-9(2)12-7-13(10(3)4)14(8-12)11(5)6;2*1-2-4-5-3-1;;;/h2*7-11H,1-6H3;2*1-4H2;;;,XPFYNIUESMDERR-UHFFFAOYSA-N
InChI Key
XPFYNIUESMDERR-UHFFFAOYSA-N
Application
Cyclopentadienyl compounds of Barium are very commonly used ALD/CVD precursors for depositing Barium containing thin films; example BaTiO3; BaZrO3 films. Cyclopentadienyl groups form weaker bonds with Barium, but have stronger bonds within the ligand thus preventing carbon contamination of the films. Cyclopentadienyl precursors of barium sublime under reduced pressures, with tetrahydrofuran adducts showing volatility also under atmospheric pressure. The tetrahydrofuran adducts loose the coordinated THF when evaporated. Complexes with bulky cyclopentadienyl ligands are more thermally stable and volatile.Barium containing thin films finds applications as host lattices for luminescent materials, high temperature superconductors, high permittivity dielectrics and ferroelectrics.
Packaging
1 g in glass bottle