Bis(triisopropylcyclopentadienyl)barium tetrahydrofuran adduct

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Vapor Deposition Precursors

Bis(triisopropylcyclopentadienyl)barium tetrahydrofuran adduct

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Catalog Number

ACMA00016295

Product Name

Bis(triisopropylcyclopentadienyl)barium tetrahydrofuran adduct

Category

Vapor Deposition Precursors

Synonyms

Bis(1,2,4-triisopropylcyclopentadienyl)barium,Bis[1,2,4-tris(1-methylethyl)-2,4-cyclopentadien-1-yl]barium

Molecular Formula

[Ba(C5(C3H7)3H2)2] ⋅ 2(C4H8O)

Canonical SMILES

CC(C)[C]1[C][C](C(C)C)[C][C]1C(C)C.CC(C)[C]2[C][C](C(C)C)[C][C]2C(C)C.[Ba].C3CCOC3.C4CCOC4

InChI

1S/2C14H23.2C4H8O.Ba.2H/c2*1-9(2)12-7-13(10(3)4)14(8-12)11(5)6;2*1-2-4-5-3-1;;;/h2*7-11H,1-6H3;2*1-4H2;;;,XPFYNIUESMDERR-UHFFFAOYSA-N

InChI Key

XPFYNIUESMDERR-UHFFFAOYSA-N

Melting Point

284-289 °C

Application

Cyclopentadienyl compounds of Barium are very commonly used ALD/CVD precursors for depositing Barium containing thin films; example BaTiO3; BaZrO3 films. Cyclopentadienyl groups form weaker bonds with Barium, but have stronger bonds within the ligand thus preventing carbon contamination of the films. Cyclopentadienyl precursors of barium sublime under reduced pressures, with tetrahydrofuran adducts showing volatility also under atmospheric pressure. The tetrahydrofuran adducts loose the coordinated THF when evaporated. Complexes with bulky cyclopentadienyl ligands are more thermally stable and volatile.Barium containing thin films finds applications as host lattices for luminescent materials, high temperature superconductors, high permittivity dielectrics and ferroelectrics.

Storage

room temp

Form

powder

Packaging

1 g in glass bottle

MSDS

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COA

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Spec Sheet

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